High Purity Aluminum Target (Al Target)

High-purity aluminum sputtering target for semiconductor chips; purity ≥99.999%, grain size ≤90 μm

High Purity Aluminum Target (Al Target)

Product Introduction

High-purity aluminum sputtering target for semiconductor chips; purity ≥99.999%, grain size ≤90 μm

Specifications

No specification data yet

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